LCD requires uniform electrode patterns to realize a good image display. If the pattern width does not coincide with the target, critical defects such as ``open`` or ``short`` may occur. Taguchi dynamic characteristic approach is used to improve the processes of photo exposure, development and etching, to get uniform pattern width in advance technologically. Transformability is also used for ideal process function because the photo mask pattern width is varying from the target which is used as an input to the process. This research shows that the improvement of ideal function of relevant process is possible using Taguchi dynamic characteristic SN ratio, which is effective on securing precedence, universality and reproducibility of technology to optimize the process and facility condition.